Studies of the hot-pressed TiN material by electron spectroscopies
PBN-AR
Instytucja
Instytut Chemii Fizycznej Polskiej Akademii Nauk
Informacje podstawowe
Główny język publikacji
en
Czasopismo
JOURNAL OF ALLOYS AND COMPOUNDS
ISSN
0925-8388
EISSN
Wydawca
ELSEVIER SCIENCE SA
DOI
URL
Rok publikacji
2013
Numer zeszytu
Strony od-do
280-285
Numer tomu
546
Identyfikator DOI
Liczba arkuszy
Słowa kluczowe
en
Hot-pressed sputtering target
Titanium nitride
X-ray photoelectron spectroscopy
Elastic-peak electron spectroscopy
Surface composition
Bulk composition
Electron inelastic mean free path
Streszczenia
Język
en
Treść
We analyzed chemical composition and electron transport phenomena in surface and sub-surface region of hot-pressed TiN specimens using a combination of X-ray photoelectron spectroscopy (XPS) and elastic-peak electron spectroscopy (EPES) techniques. Both the surface chemical composition and the elements distribution in the bulk of TiN specimens were determined using XPS and XPS depth profiling analysis. In addition to TiN, a mixture of Ti oxynitride (TiOxNy) and TiO2 compounds as well as carbon contaminants have been detected in the surface region of the TiN specimens. The elemental depth-profiles disclosed uniform chemical bulk composition formed mainly by titanium and nitrogen as well as carbon and oxygen contaminants. Surface enrichment of Ti was evidenced as result of Ar ion-induced preferential sputtering of nitrogen. The inelastic mean free path (IMFP) data evaluated from the relative EPES for electron energies 0.5–2 keV were uncorrected for surface excitations and compared with those calculated from the predictive TPP-2M formula for the measured surface composition. Except to the electron energy of 0.5 keV, a good agreement was found between the measured and predicted IMFPs in the TiN specimen. The higher discrepancies in the measured IMFPs at the lowest energy can be explained by the surface excitation effect. The smallest root-mean-square-deviation and the mean percentage deviation of 2.8 Å and 14.8%, respectively, were found between EPES IMFP data and those predicted for TiN with respect to the Ni standard.
Cechy publikacji
ORIGINAL_ARTICLE
Inne
System-identifier
669458
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