Thickness and structure change of titanium (IV) oxide thin films synthesized by the sol–gel spin coating method
PBN-AR
Instytucja
Wydział Fizyki Technicznej i Matematyki Stosowanej (Politechnika Gdańska)
Informacje podstawowe
Główny język publikacji
ENG
Czasopismo
OPTICAL MATERIALS
ISSN
0925-3467
EISSN
Wydawca
DOI
URL
Rok publikacji
2014
Numer zeszytu
10
Strony od-do
1739-1744
Numer tomu
36
Identyfikator DOI
Liczba arkuszy
Słowa kluczowe
ANATASE
RUTILE
SOL–GEL METHOD
TITANIUM DIOXIDE
Streszczenia
Język
Treść
Titanium dioxide is a well-known material in nanotechnology, while it provides new opportunities due to its interesting properties, for example, as a semiconductor with a quite significant forbidden band gap energy of 3.2 eV. In this study, thin films of titanium dioxide (TiO2) were synthesized in amorphous and crystallographic systems using the sol–gel process. Atomic Force Microscopy (AFM), Raman spectroscopy and X-ray diffraction (XRD) techniques were applied to obtain structural characteristics of the prepared films. We estimated that TiO2 thin films crystallize in anatase phase between temperatures 380 °C and 700 °C, and into anatase–rutile phase at 650 °C, while rutile phase exists alone above 800 °C. The changes in porosity of materials in relation to temperature were calculated as well. The refractive index of titanium dioxide thin films from ellipsometric measurements is also provided.
Inne
System-identifier
127996