Electrochemical oxidation of sulphamerazine at boron-doped diamond electrodes: Influence of boron concentration
PBN-AR
Instytucja
Wydział Elektroniki, Telekomunikacji i Informatyki (Politechnika Gdańska)
Informacje podstawowe
Główny język publikacji
ENG
Czasopismo
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
ISSN
1862-6300
EISSN
Wydawca
DOI
URL
Rok publikacji
2013
Numer zeszytu
10
Strony od-do
2040-2047
Numer tomu
210
Identyfikator DOI
Liczba arkuszy
Słowa kluczowe
BORON-DOPED DIAMOND ELECTRODE
ELECTROCHEMICAL OXIDATION
MICROWAVE PLASMA CHEMICAL VAPOUR DEPOSITION
SULPHAMETOXAZOLE DEGRADATION
Streszczenia
Język
Treść
The boron-doped diamond (BDD) electrodes with different boron concentrations have been tested as electrode material for sulphamerazine (SRM) oxidation in water solution. An investigation of the electrode morphology and molecular structure was carried out using high resolution scanning electron microscopy (SEM) and Raman spectroscopy. Electrochemical results showed clearly that the kinetics and efficiency of SRM oxidation were dependent on the amount of boron incorporated in a diamond film. The mechanism of SRM oxidation was also analysed by cycle voltammograms and by identyfying oxidative species which take part in the degradation process. Te aging of the material during the operation was also studied.
Inne
System-identifier
126982