Modification of various properties of HfO2 thin films obtained by changing magnetron sputtering conditions
PBN-AR
Instytucja
Wydział Fizyki i Astronomii (Uniwersytet Wrocławski)
Informacje podstawowe
Główny język publikacji
en
Czasopismo
SURFACE & COATINGS TECHNOLOGY (35pkt w roku publikacji)
ISSN
0257-8972
EISSN
Wydawca
ELSEVIER SCIENCE SA
DOI
URL
Rok publikacji
2017
Numer zeszytu
Strony od-do
426-431
Numer tomu
320
Identyfikator DOI
Liczba arkuszy
Autorzy
(liczba autorów: 8)
Pozostali autorzy
+ 7
Słowa kluczowe
PL
EN
HfO2
Thin films
Magnetron sputtering
Microstructure
Optical properties
Mechanical properties
OPTICAL-PROPERTIES
MICROSTRUCTURE
Streszczenia
Język
EN
Treść
In this work, properties of hafnium dioxide (HfO2) thin films deposited by magnetron sputtering with different powers (i.e. 200 W, 400 W and 600 W) were described. Based on microstructure measurements obtained by X-ray diffraction, Raman scattering and transmission electron microscopy method it was observed that there is a significant influence of the sputtering power on investigated properties of HfO2 thin films. Increase of the sputtering power caused, e.g. an increase of average crystallite size and surface roughness. Microstructure of thin films deposited with lower power was composed from a large number of voids that resulted in significant changes of their optical and mechanical properties. Results of optical studies showed that all deposited thin films were well transparent in a visible light range. Refractive index increased gradually with an increase of deposition power from 1.86 (200 W) to 2.09 (600 W). Performed investigations of mechanical properties revealed that hardness and Young's elastic modulus of HfO2 thin films increased with an increase of the sputtering power. (C) 2016 Elsevier B.V. All rights reserved.
Język
Treść
Cechy publikacji
Inne
System-identifier
2017410712
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